北京高压科学研究中心
Center for High Pressure Science &Technology Advanced Research

Magnetron Sputtering


Magnetron sputtering has been established as the process of choice for the production of many industrially important coating/substrate systems. With the development of magnetron sputtering technology, more and more functional thin film materials could be obtained using it. Single Chamber Magnetron Sputtering System is a high vacuum multi-functional magnetron sputtering deposition equipment, which offers an ideal solution for new materials and research field of thin films.

Magnetron Sputtering System



Capabilities and Key parameters:

It could be used to prepare various metal films, dielectric films, and semiconductor  film.  Magnetic films can also be fabricated through ferromagnetic material (Fe, Co, Ni) sputtering.


Potential research directions: Materials science.


Contact: Hongliang Dong, hongliang.dong@hpstar.ac.cn.


Ref: P. J. Kelly. Recent advances in magnetron sputtering. Surface and Coating Technology, 112, 170-172 (1999).

SEM images of Mo films deposited on glass silica