Magnetron Sputtering
Magnetron sputtering has been established as the process of choice for the production of many industrially important coating/substrate systems. With the development of magnetron sputtering technology, more and more functional thin film materials could be obtained using it. Single Chamber Magnetron Sputtering System is a high vacuum multi-functional magnetron sputtering deposition equipment, which offers an ideal solution for new materials and research field of thin films.
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Magnetron Sputtering System |
Capabilities and Key parameters: It could be used to prepare various metal films, dielectric films, and semiconductor film. Magnetic films can also be fabricated through ferromagnetic material (Fe, Co, Ni) sputtering. Potential research directions: Materials science. Contact: Hongliang Dong, hongliang.dong@hpstar.ac.cn. Ref: P. J. Kelly. Recent advances in magnetron sputtering. Surface and Coating Technology, 112, 170-172 (1999). | SEM images of Mo films deposited on glass silica |